Calibre IC Manufacturing Solutions

A complete end-to-end solution including all curvilinear data preparation steps from retargeting to SRAF, OPC, MPC, and MDP that addresses the curvilinear mask generation needs of specialty applications (SiPh) and memory designs.

Technology enablement for photolithography processes, including extreme ultraviolet (EUV). Calibre computational lithography tools offer improved accuracy, speed and reduced cost of ownership.

Enables mask data format conversion and verification tasks for mask fabrication including the latest multi-beam mask formats in a fully compatible Calibre platform.

Provides optimizations for e-beam mask writers. New correction and modeling capabilities improve mask critical dimension linearity and uniformity for advanced nodes.

Meets the challenges of production throughput and system utilization management while achieving fast turnaround times despite ever increasing complexity and data volumes.

Improves product yield and provides faster ramp by structuring and analyzing massive amounts of data, creating predictive machine learning models and generating actionable analysis.

The broadest, most accurate, and best performing DFM solution in the industry.

Calibre offers a complete flow infrastructure solution delivering superior runtime and consistency to meet the manufacturing requirements of memory devices and products with highly repetitive arrays.