As advanced lithography pushes beyond traditional Manhattan geometries, mask and wafer realities no longer match idealized rectilinear design intent. With rounded corners, increasing pattern complexity, and the rise of curvilinear mask flows enabled by multi-beam mask writers, Calibre nmCLBIAS helps support the industry’s shift toward more accurate, manufacturable pattern representation for next-generation processes.
Calibre nmCLBIAS is a curvilinear version of production-hardened Calibre nmBIAS tool, which has been used by major foundries for over 12 years. Calibre nmCLBIAS is a scalable and efficient retargeting tool that provides biasing solutions for curvilinear designs.
Calibre nmCLBIAS provides rule-based biasing/retargeting for curvilinear designs with improved edge filtering for classification, enhanced edge movement engine, and gradual fragment smoothing at corners.
The Calibre nmCLBIAS retargeting engine provides scalable and efficient pre-OPC retargeting and biasing solutions to meet customer runtime requirements.
Calibre nmCLBIAS is easy to use and flexible, allowing user-defined fragmentation control, tag-based biasing, biasing-rule table specification, and interpolation of biasing rules and more.
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The Calibre tool suite delivers accurate, efficient, comprehensive IC verification and optimization across all process nodes and design styles while minimizing resource usage and tapeout schedules.